Panmela Castro
To Walk n. 1, Marked Clothing series, 2017
Photo performance
Inkjet printing on semi-gloss photo paper
Inkjet printing on semi-gloss photo paper
110 x 72 cm
Edition of 5 + 1 AP
Copyright The Artist
Photo: Renata Anchieta
Registry of the 2017 “To Walk” performance held at Rua Tavares Bastos, in front of Panmela Castro's studio, in Rio de Janeiro.